Semiconductor

Cleaning suited to your substrate and process.

Particle and surface contamination are central concerns in semiconductor production. We assess ultrasonic cleaning parameters for your substrate, structures and process stage.

Applications & requirements
Particle contamination
Surface preparation
Process compatibility

01Working since 1973

Prime contractor to automotive, aerospace, nuclear and steel since ultrasonic cleaning moved from the hospital to the shop floor.

02Fixture and tank, one building

Design, machining, fabrication and testing on one floor near Mumbai, so the thing that holds your part is made by the people who built the machine.

03Proved on your own part

We clean a sample and filter the residue, so the acceptance criteria are agreed on evidence rather than on a specification.

FAQs

A few things you might want to know.

Particle and surface contamination are central concerns in semiconductor production. We assess ultrasonic cleaning parameters for your substrate, structures and process stage.

Tell us about your parts and process. We'll check equipment suitability with you before making a recommendation.

Include component photographs or drawings, material details, the contamination to remove, required cleanliness and production volume. Mention any limits on temperature, chemistry or available floor space.

Ultrasonic Cleaning in Semiconductor Manufacturing

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Industry context: Repeated circuit dies on a silicon wafer.

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your process.

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Semiconductor

Cleaning suited to your substrate and process.

FAQs

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Ultrasonic Cleaning in Semiconductor Manufacturing

Tell us aboutyour process.

Tell us about
your process.